+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Nanoscale imagingExhibition Dates and Hours:Tuesday 14 February | 10:00 am to 5:00 pmWednesday 15 February | 10:00 am to 4:00 pm
When
14 Feb 2012 @ 10:00 am
15 Feb 2012 @ 04:00 pm
Duration: 1 days, 6 hours
Where
San Jose Convention Center
408 South Almaden Boulevard
Central San Jose
United States
Language
English en
Organised by
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