The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.Help solve the most pressing issues in:Mask Making + Mask data preparation + Substrates and materials + Patterning tools and processes + Resist and resist processing + Etch techniques + Metrology + Inspection + Repair + Cleaning, contamination, and haze + Simulation of mask makingEmerging Mask Technologies + EUV mask making + EUV mask inspection and repair + EUV mask infrastructure + Nanoimprint mask making + Nanoimprint mask application + Pixelated masks + Alternative mask technologies + Mask process correction + Grey-scale masks + Direct-write, ML²Mask Application + Double- and multi-patterning + Resolution enhancement techniques and OPC + Source and mask optimization + Design for manufacturability + Patterned media + Simulation and modelingMask Business + Mask manufacturing control + Mask shop management + Mask management in wafer fabs + Business aspects of mask + Infrastructure Exhibition Dates and Hours:Tuesday 11 September | 10:00 am to 4:30 pm; 6:30 pm to 8:00 pmWednesday 12 September | 10:00 am to 4:00 pm
When
10 Sep 2012 @ 08:00 am
13 Sep 2012 @ 05:00 pm
Duration: 3 days, 9 hours
Where
Monterey Marriott and Monterey Conference Center
298 Portola Plaza
Monterey
United States
Language
Englishen
Organised by
SPIE - The international society for optics and photonics (deactivated)
Event published: 7 Dec 2011 Event last updated: 18 Jul 2016
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