Featuring presentations on: + Extreme Ultraviolet (EUV) Lithography + Alternative Lithographic Technologies + Metrology, Inspection, and Process Control for Microlithography + Advances in Resist Materials and Processing Technology + Optical Microlithography + Design for Manufacturability through Design-Process IntegrationCourses: Advanced Lithography 2013 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2013 course lists and descriptions will be available September 2012.Exhibition Overview: The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years. See the latest technology in advanced lithography: + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Nanoscale imaging Exhibition Dates and Hours:Tuesday 26 February | 10:00 am to 5:00 pmWednesday 27 February | 10:00 am to 4:00 pm