The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.Help solve the most pressing issues in:Mask Making  + Mask data preparation + Substrates and materials + Patterning tools and processes + Resist and resist processing + Etch techniques + Metrology + Inspection + Repair + Cleaning, contamination, and haze + Simulation of mask makingEmerging Mask Technologies + EUV mask making + EUV mask inspection and repair + EUV mask infrastructure + Nanoimprint mask making + Nanoimprint mask application + Pixelated masks + Alternative mask technologies + Mask process correction + Grey-scale masks + Direct-write, ML²Mask Application + Double- and multi-patterning + Resolution enhancement techniques and OPC + Source and mask optimization + Design for manufacturability   + Patterned media   + Simulation and modelingMask Business + Mask manufacturing control + Mask shop management + Mask management in wafer fabs   + Business aspects of mask   + Infrastructure