The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years. See the latest technology in advanced lithography: + Etch Technology for nanopatterning + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Nanoscale imaging Exhibition Dates and Hours:Tuesday 25 February 2014 | 10:00 am to 5:00 pmWednesday 26 February 2014 | 10:00 am to 4:00 pm